III-V ICP Etcher

Danmarks Tekniske Universitet (DTU) requires a high‑performance inductively coupled plasma (ICP) reactive ion etcher to serve as the core instrument for an optical‑devices research project. The system **** ** **** ****** *** ******* **** *********** ********** **** ****** ************* *** **** ************ ****** **** ** * ****** *********** ********** ******** **** ******** ******** ** ****** *** **************** *** ******* ******* *** **************** ************* *** ********** **** ** ********* ** **** ** ********* *** ** ***** **** *** ***** ******* ** ***** *** **** **** ** ********* **** ***** ******** ************** ** ******* ****** ********** ***** ***** ********* *** ****** **** ** ******* ** ********** * ***** ***** ** ***** *************** ********* ***** ******* ******* ********** *** **** **** *********** *************** **** **** ******* *** *********** ****** *********** ************* ** ******** ** *** ******* ************* *** ******** ******** ************ ******** *** ********** ********** ******** **** *** ********** ** ***** *********** ****** ***** ******** ************ *** ********** **** ****** **** ** ****** *** ************* **********

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Details

Status:

Awarded

Procedure type:

Open Procedure

Sectors:

38000000 - Laboratory, optical and precision equipments (excl. glasses)

Place of origin:

Denmark

Places of performance:

Denmark

Contract duration:

12 MONTH

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