High-vacuum chamber for thin-film synthesis
The University of Helsinki’s Helsinki Accelerator Laboratory (HAL) will acquire a multi‑source high‑vacuum (HV) chamber designed for thin‑film deposition by magnetron sputtering. The chamber must acco******* ** ** ****** ********** ********** *** ****** * ************ **** ** *** **** ********* *** ***** ******* *** ********** ** ** ******** ** **** ******** ********** ******* **** ******* ** ************** ********* ********** ******* *************** ********* ********** ******* *** ********** ******* ********* ********** ******** ****** ***** ********* **** *********** ** ****** *** ******** ******* ** *** ********** ***** **** ******* *** ***** ********* ************ ********* *** ********** ********* *** ******* *** ****** ** ***** ** * ******** *** *********** ******** *** ********* *** ************** **** ************* ******* ******** ******** *************** *********** ******** ********** ********* ******* *** ************** ********** ********** ** ********** ************* ***** ********** **** *** ****** ***** ********* ******* ********** **************** *** * ********* ******* *** ******** **** **** ******* *** ********* ****** **** ***** ****** ********* ** *********** **** ********* ******* ********** *** ****** ****** *** ****** ****** ********** ******* ******* **** ***************** **** ** ************* ************ *** ****** ********* *** ***** *** *********** ** ******* ****** ************ ******** ********* *************** ********* ******* ************ *** *********** ********** ********* *** ******** ** ******* ** *** ****** **************
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Details
Status:
Awarded
Sectors:
38000000 - Laboratory, optical and precision equipments (excl. glasses)
Place of origin:
Finland
Places of performance:
Finland
Contract duration:
3 MONTH
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